Excimer Laser Ablation of High Aspect Ratio Microvias Using a Novel Sensitizer-Enhanced Photopolymer

F. Sarwar; Z. Chen; J. Wu; D.C. Webster; V.R. Marinov

doi:10.4071/imaps.294

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Sarwar, F., Z. Chen, J. Wu, D.C. Webster, and V.R. Marinov. 2011. “Excimer Laser Ablation of High Aspect Ratio Microvias Using a Novel Sensitizer-Enhanced Photopolymer.” Journal of Microelectronics and Electronic Packaging 8 (2): 66–71. https://doi.org/10.4071/imaps.294.

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