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Vol. 7, Issue 2, 2010April 01, 2010 EDT

Thermomechanical Stresses in Copper Films at Elevated Temperature

Martin Lederer, Javad Zarbakhsh, Rui Huang, Thomas Detzel, Brigitte Weiss,
Copper filmstemperature cycleplasticity modelingthermomechanical stresswafer curvature
Copyright Logoccby-nc-nd-4.0 • https://doi.org/10.4071/1551-4897-7.2.99
Journal of Microelectronics & Elect Pkg
Lederer, Martin, Javad Zarbakhsh, Rui Huang, Thomas Detzel, and Brigitte Weiss. 2010. “Thermomechanical Stresses in Copper Films at Elevated Temperature.” Journal of Microelectronics and Electronic Packaging 7 (2): 99–104. https:/​/​doi.org/​10.4071/​1551-4897-7.2.99.
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