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Vol. 4, Issue 2, 2007April 01, 2007 EDT

Development of High Reliability Via on IVH (VONI) for High Density Interconnect Circuit Boards

Jong-Won Park, Yun-Seok Hwang, Il-Kyoon Jeun, Da-Hee Joung, Myung-Gun Chong, Dek-jin Yang,
Via on IVHHigh density interconnects (HDI)DelaminationIVH barrel crackplugging inkmoisture adsorption
Copyright Logoccby-nc-nd-4.0 • https://doi.org/10.4071/1551-4897-4.2.78
Journal of Microelectronics & Elect Pkg
Park, Jong-Won, Yun-Seok Hwang, Il-Kyoon Jeun, Da-Hee Joung, Myung-Gun Chong, and Dek-jin Yang. 2007. “Development of High Reliability Via on IVH (VONI) for High Density Interconnect Circuit Boards.” Journal of Microelectronics and Electronic Packaging 4 (2): 78–85. https:/​/​doi.org/​10.4071/​1551-4897-4.2.78.
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