Skip to main content
null
Journal of Microelectronics & Elect Pkg
  • Menu
  • Articles
    • General
    • Technical Article
    • All
  • For Authors
  • Editorial Board
  • About
  • Issues
  • IMAPSource Proceedings
  • search
  • LinkedIn (opens in a new tab)
  • RSS feed (opens a modal with a link to feed)

RSS Feed

Enter the URL below into your favorite RSS reader.

http://localhost:42599/feed
General
Vol. 2, Issue 3, 2005July 01, 2005 EDT

Pretreatment of Blind Via Holes before Ni/Au and Cu Plating Applied with Atmospheric Pressure Plasma Jet

Yasushi Sawada, Keiichi Yamazaki, Noriyuki Taguchi, Tetsuji Shibata,
atmospheric pressure plasmadesmearsurface modificationblind via holephotolithographylaser-drillingwetting property
Copyright Logoccby-nc-nd-4.0 • https://doi.org/10.4071/1551-4897-2.3.189
Journal of Microelectronics & Elect Pkg
Sawada, Yasushi, Keiichi Yamazaki, Noriyuki Taguchi, and Tetsuji Shibata. 2005. “Pretreatment of Blind Via Holes before Ni/Au and Cu Plating Applied with Atmospheric Pressure Plasma Jet.” Journal of Microelectronics and Electronic Packaging 2 (3): 189–96. https:/​/​doi.org/​10.4071/​1551-4897-2.3.189.

View more stats

This website uses cookies

We use cookies to enhance your experience and support COUNTER Metrics for transparent reporting of readership statistics. Cookie data is not sold to third parties or used for marketing purposes.

cookies
cookies
cookies
Powered by Scholastica, the modern academic journal management system